Structure, design structure and method of manufacturing a structure having vias and high density capacitors

ABSTRACT

A method of making a semiconductor structure includes forming at least a first trench and a second trench having different depths in a substrate, forming a capacitor in the first trench, and forming a via in the second trench. A semiconductor structure includes a capacitor arranged in a first trench formed in a substrate and a via arranged in a second trench formed in the substrate. The first and second trenches have different depths in the substrate.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a divisional application of U.S. application Ser.No. 12/191,379, filed on Aug. 14, 2008, which is related to U.S.application Ser. No. 12/191,385, filed on Aug. 14, 2008, the contents ofwhich are incorporated by reference herein in their entirety.

FIELD OF THE INVENTION

The invention generally relates to a design structure, and moreparticularly, to a structure, design structure and method ofmanufacturing a structure or semiconductor device having vias and highdensity capacitors which are formed substantially at the same timeand/or substantially simultaneously.

BACKGROUND

Passive elements such as inductors, resistors, and capacitors areessential parts in any RF wireless circuit. A capacitor is anelectrical/electronic device that can store energy in the electric fieldbetween a pair of conductors (called “plates”). The process of storingenergy in the capacitor is known as “charging”, and involves electriccharges of equal magnitude, but opposite polarity, building up on eachplate. Capacitors are often used in electric and electronic circuits asenergy-storage devices. They can also be used to differentiate betweenhigh-frequency and low-frequency signals. This property makes themuseful in electronic filters.

Large capacitors are particularly needed for decoupling purposes inorder to satisfy power supply requirements and/or minimize signal noise.Typically, a large area is required (about 10⁶ um²) to produce anano-farad capacitor with current on-chip capacitor capability. However,high value capacitors are difficult to manufacture on-chip. As a result,it is often the case that surface mount capacitors are utilized instead.This is because surface mount capacitors minimize packaging costsrelative to high value capacitors.

Accordingly, there exists a need in the art to overcome the deficienciesand limitations described hereinabove.

SUMMARY

In a first aspect of the invention, there is provided a method of makinga semiconductor structure, that includes forming at least a first trenchand at least a second trench in a substrate and having different depths.The method further includes forming a capacitor in the first trench andforming a via in the second trench.

In a second aspect of the invention, there is provided a method ofmaking a semiconductor structure, comprising forming a capacitor in afirst trench formed in a substrate and forming a via in a second trenchformed in the substrate. The first and second trenches have differentdepths in the substrate.

In a third aspect of the invention, there is provided a method of makinga semiconductor structure, comprising forming at least a first trench ata first depth in a substrate. The method further includes forming atleast a second trench at a second greater depth in the substrate,forming a capacitor in the first trench, and forming a via in the secondtrench.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

The present invention is described in the detailed description whichfollows, in reference to the noted plurality of drawings by way ofnon-limiting examples of exemplary embodiments of the present invention.

FIG. 1 shows a substrate for a semiconductor structure according to theinvention;

FIG. 2 shows a device formed on the substrate of FIG. 1 according to theinvention;

FIG. 3 shows a dielectric layer formed over the structure of FIG. 2according to the invention;

FIG. 4 shows trenches formed in the structure of FIG. 3 according to theinvention;

FIG. 5 shows a recess formed in the shallow trench of the structure ofFIG. 4 according to the invention;

FIG. 6 shows the structure of FIG. 5 after a first conductive film isformed in the trenches according to the invention;

FIG. 7 shows the structure of FIG. 6 after a dielectric film is formedin the trenches according to the invention;

FIG. 8 shows the structure of FIG. 7 after a second conductive film isformed in the trenches according to the invention;

FIG. 9 shows the structure of FIG. 8 after the upper or front sidesurface of the structure is polished to form the vias and a capacitoraccording to the invention;

FIG. 10 shows the structure of FIG. 9 after a the back surface of thestructure is ground and after a backside metal layer is applied theretoaccording to the invention;

FIG. 11 shows a flow diagram illustrating a non-limiting method ofmaking a semiconductor structure of FIGS. 1-10 according to theinvention;

FIG. 12 shows a substrate for another semiconductor structure accordingto the invention;

FIG. 13 shows a device and a doped region formed on the substrate ofFIG. 12 according to the invention;

FIG. 14 shows a dielectric layer formed over the structure of FIG. 13according to the invention;

FIG. 15 shows trenches formed in the structure of FIG. 14 according tothe invention;

FIG. 16 shows a recess formed in the shallow trench of the structure ofFIG. 15 according to the invention;

FIG. 17 shows the structure of FIG. 16 after a first conductive film isformed in the trenches according to the invention;

FIG. 18 shows the structure of FIG. 17 after a dielectric film is formedin the trenches according to the invention;

FIG. 19 shows the structure of FIG. 18 after a second conductive film isformed in the trenches according to the invention;

FIG. 20 shows the structure of FIG. 19 after the upper or front sidesurface of the structure is polished to form the vias and a capacitoraccording to the invention;

FIG. 21 shows the structure of FIG. 20 after a the back surface of thestructure is ground and after a backside metal layer is applied theretoaccording to the invention;

FIG. 22 shows a flow diagram illustrating a non-limiting method ofmaking a semiconductor structure of FIGS. 12-21 according to theinvention;

FIG. 23 shows a structure similar to that of FIGS. 12-21 except that norecess is formed in the shallow trench according to the invention;

FIG. 24 show a flow diagram illustrating a non-limiting method of makinga semiconductor structure of FIG. 23 according to the invention; and

FIG. 25 is a flow diagram of a design process used in semiconductordesign, manufacturing, and/or testing.

DETAILED DESCRIPTION

It would be advantageous to fabricate high value capacitors with lowercosts so that they can be used more readily for decoupling purposes inorder to, among other things, satisfy power supply requirements and/orminimize signal noise.

The invention is directed to a design structure, method and structure orsemiconductor device having vias and one or more high (defined asgreater than about 100 fF/μm²) density capacitors which are formedsubstantially at the same time and/or substantially simultaneously, aswell as a method of making a structure or semiconductor device havingvias and one or more high density capacitors formed substantiallysimultaneously.

The invention is also directed to a method of performing a thru wafervia process on trenches that have different sizes such that, during thesame thru wafer via process, a first trench is formed which terminateswithin the substrate while a second trench is formed extending entirelythrough the substrate. A capacitor is formed within the first trench anda through wafer via is formed in the second trench.

FIGS. 1-11 show an exemplary semiconductor structure and method ofmaking the structure which produces one or more high density capacitorsand one or more vias essentially at the same time. Because thecapacitors are formed at essentially the same time as the vias, the costof using and/or making high density capacitors in the structure isreduced.

With reference to FIG. 1, there is shown a substrate 10. The substrate10 can be any material typically used in wafer manufacturing such as,for example, Si, SiGe, SiC, SiGeC, etc. The substrate 10 may befabricated using techniques well know to those skilled in the art. Thesubstrate 10 may also have any desired thickness based upon the intendeduse of the final semiconductor structure and can be between about 50 umand about 300 um.

With reference to FIG. 2, there is shown at least one device 20 formedon the substrate 10. The device 20 can be any type of device typicallyformed on a substrate such as, for example, a transistor, an NPN, a FET(nFET or pFET), a RF wireless circuit device, etc. Any of the typicalprocesses used to form such devices can be utilized to form the device20.

With reference to FIG. 3, a dielectric and/or isolation layer 30 isformed over the device 20 and substrate 10. The layer 30 can be of anymaterial typically formed over devices and in areas which will receivetrenches that form structures such as vias. By way of non-limitingexample, the material for the layer 30 is a glass such asBorophosphosilicate glass (BPSG), and is applied by techniques such aschemical vapor deposition (CVD). The layer 30 is preferably appliedand/or formed to a thickness of between about 2,000 Å (angstroms) andabout 10,000 Å. The layer 30 also functions to, among other things,protect the device 20 (and regions thereof) from downstream processingsuch as etching and/or trench formation.

With reference to FIG. 4, deep trenches or holes 40 and shallow trenchesor holes 50 are formed in the dielectric layer 30 and substrate 10. Thedeeper trenches 40 will form vias, and are therefore made deeper thanthe shallow trenches 50 that will form capacitors. By way ofnon-limiting example, the depth of the capacitor trench 50 can bebetween about 50% and about 75% as deep as the via trenches 40.Preferably, a significant amount of substrate remains under the shallowtrenches 50 so that when the structure receives a backside metal layer,this portion of the substrate will prevent electrical contact (and/orprovide electrical insulation) between the capacitor and the backsidemetal layer.

The trenches 40 and 50 can be formed using any known trench formingtechniques, but are preferably formed at substantially the same timeand/or using one or two process steps, i.e., trenches 40 and 50 arepreferably formed in the same etching or process steps. Such techniquestypically include using one ore more masking and etching steps. In orderto form the trenches 40 and 50 so as to have different depths, a maskhaving smaller openings can be used to form the trenches 50, whereaslarger openings can be used to form trenches 40. By way of non-limitingexample, the width or opening diameter of the openings which will formthe trenches 50 can preferably be between about 2 microns and about 20microns, whereas the width or opening diameter of the openings whichwill form the trenches 40 can preferably be between about 3 microns andabout 30 microns.

With reference to FIG. 5, a recess or pedestal trench 60 can be formedin the trenches 50 which will form the capacitor(s). The recess 60 isformed in the layer 30 and is preferably formed using another etchingstep or process. Such techniques typically include using one or moremasking and etching steps. In order to form the recess 60, aphotolithographic mask is used to prevent unwanted etching of thetrenches 40 and 50. By way of non-limiting example, the width or openingdiameter of the recess 60 can preferably be between about 4 microns andabout 30 microns, whereas the depth of the recess can preferably bebetween about 0.5 microns and about 2 microns.

With reference to FIG. 6, a first conductive or metal film 70 is formedin the trenches 40 and 50. The film 70 can be a material such as, forexample, TiN, TaN, W, and Ta, and is preferably formed using an atomiclayer deposition (ALD) process. Such techniques typically include usingone or more masking and deposition steps. By way of non-limitingexample, the thickness of the first metal film 70 can preferably bebetween about 1000 Å (angstroms) and about 5,000 Å.

With reference to FIG. 7, a dielectric film 80 is then formed in thetrenches 40 and 50 over the film 70. The film 80 can be a material suchas, for example, Si₃N₄, Al₂O₃, HfO₂, Ta₂O₅, and is preferably formedusing an ALD or a CVD process. By way of non-limiting example, thethickness of the dielectric film 80 can preferably be between about 100Å (angstroms) and about 500 Å or less.

With reference to FIG. 8, a second conductive or metal film 90 is thenformed in the trenches 40 and 50 over the film 80. The film 90 can be amaterial such as, for example, TiN, TaN, W, and Ta, and is preferablyformed using a CVD process. By way of non-limiting example, the secondmetal film 90 preferably substantially or completely fills the trenches40 and 50 and can be applied to a thickness over layer 30 of a fewmicrons or less. The invention contemplates using the same mask to formthe three films 70, 80 and 90, although this will likely requiredifferent process tools or processing steps.

With reference to FIG. 9, the front side of the structure of FIG. 8 isthen subjected to a material removing step, e.g., a polishing step,which removes the metal film 90 over the layer 30. The polishing canalso remove an upper surface portion of the layer 30. At this point, acapacitor C and vias V are formed. The vias V may be a through wafer via(TWV). The capacitor can be a MIM capacitor or a high density capacitor.By way of non-limiting example, the thickness of the layer 30 whichremains after polishing can preferably be between about 2,000 Å(angstroms) and about 10,000 Å.

With reference to FIG. 10, the back side of the structure of FIG. 9 issubjected to a material removing step, e.g., a grinding step, whichremoves an amount of the substrate 10. A back side metal layer BM isthen applied thereto. As a result, the vias V become electricallyconnected to the back side metal layer BM, while the capacitor C remainselectrically insulated therefrom. The layer BM can be a barrier layerand is preferably a material such as, for example, aluminum, nickel,gold, copper, and tungsten. By way of non-limiting example, the spacingor thickness of the substrate 10 between the layer BM and the firstmetal film of the capacitor C can preferably be between about 10 micronsand about 30 microns. The structure in FIG. 10 can then be subjected tofurther processing steps in order to form a completed semiconductorstructure. Such processing will then typically provide electricalconnections between the capacitor C and vias V and structures which willbe formed over the layer 30.

As is apparent from FIG. 10, the vias V formed according to theinvention include a metal film and a dielectric film surrounding the viametal 90. These films do not adversely affect the function of the viasV. Furthermore, because these films are formed at the same time as thecorresponding films of the capacitor C, the additional processing costsinvolved in forming such films in the vias V is minimal, and are offsetby the advantageous provided by using capacitors in the structure.

With reference to FIG. 11, there is shown a non-limiting method ofmaking a semiconductor structure of FIGS. 1-10 which includes the stepof forming a device on a substrate in step 1000 (see also FIG. 2).Trenches are then formed in the structure which extend into thesubstrate in step 1010 (see also FIG. 4). This is followed by forming arecess in the shallow trench in step 1020 (see also FIG. 5). Thereafter,a first metal film is formed in the trenches in step 1030 (see also FIG.6). Then, a dielectric film is formed in the trenches over the firstmetal film in step 1040 (see also FIG. 7). This is followed with asecond metal film being formed in the trenches over the dielectric filmin step 1050 (see also FIG. 8). Next, the front side of the structure ispolished so as to form the capacitor and the vias in step 1060 (see alsoFIG. 9). Finally, the back side of the structure is ground and a backside metal layer is applied thereto in step 1070 (see also FIG. 10).

FIGS. 12-22 shows another exemplary semiconductor structure and methodof making the structure which produces one or more high densitycapacitors and one or more vias essentially at the same time. Again,because the capacitors are formed at essentially at the same time as thevias, the cost of using and/or making high density capacitors in thestructure is reduced. However, the process of making this embodimentrequires an additional mask.

With reference to FIG. 12, there is shown a substrate 110. The substrate110 can be similar to substrate 10 discussed above such as, for example,Si, SiGe, SiC, SiGeC, etc. The substrate 110 may be fabricated usingtechniques well know to those skilled in the art and may also have anydesired thickness based upon the intended use of the final semiconductorstructure.

With reference to FIG. 13, at least one device 120 is formed on thesubstrate 110. The device 120 can be any type of device typically formedon a substrate as discussed above with reference to FIG. 2. At least onedoped region 125 is also preferably formed on the substrate 110. Theregion 125 can be any type of doped region typically formed on asubstrate which functions to conduct electricity and/or as a capacitorelectrode such as, arsenic doped n-Well or boron doped p-Well. Any ofthe typical processes used to form such regions can be utilized to formthe region 125 such as ion implantation. The region 125 is preferablyformed with a depth of between about 1 micron and about 5 microns.Different masks are likely required to form the device 120 and theregion 125 so that these devices will likely be formed in or atdifferent process steps.

With reference to FIG. 14, a dielectric layer 130 is formed over thedevice 120, the region 125, and the substrate 110. The layer 130 can beof any material typically formed over devices and in areas which willreceive trenches that form structures such as vias as discussed inreference to FIG. 3. Again, the layer 130 also functions to, among otherthings, protect the device 120 (and regions thereof) and the region 125from downstream processing such as etching and/or trench formation.

With reference to FIG. 15, deep trenches or holes 140 and shallowtrenches or holes 150 are formed in the dielectric layer 130 andsubstrate 110. The deeper trenches 140 will form vias, and are thereforemade deeper than the shallow trenches 150 that will form capacitors. Theshallow trench 150 is also formed in the doped region 125 so as toprovide a conductive path to the capacitor that will be formed in thetrench 150. By way of non-limiting example, the depth of the capacitortrench 150 can be between about 50% and about 75% as deep as the viatrenches 140. Preferably, a significant amount of substrate remainsunder the shallow trench(s) 150 so that when the structure receives abackside metal layer, this portion of the substrate will preventelectrical contact (and/or provide electrical insulation) between thecapacitor and the backside metal layer.

The trenches 140 and 150 can be formed in the same way as was discussedabove with regard to FIG. 4, i.e., using any known via trench formingtechniques, but are preferably formed at substantially the same timeand/or using the same process step. Thus, trenches 140 and 150 arepreferably formed in the same etching step or process. Again, in orderto form the trenches 140 and 150 so as to have different depths, a maskhaving smaller openings can be used to form the trenches 150, whereaslarger openings can be used to form trenches 140. As in the previousembodiment, the width or opening diameter of the openings which willform the trenches 150 can preferably be between about 2 microns andabout 20 microns, whereas the width or opening diameter of the openingswhich will form the trenches 140 can preferably be between about 3microns and about 30 microns.

With reference to FIG. 16, a recess 160 can be formed in the trenches150 which will form the capacitor(s). The recess 160 can be formed inthe same way as was discussed above in reference to FIG. 5. Again, byway of non-limiting example, the width or opening diameter of the recess160 can preferably be between about 4 microns and about 30 microns,whereas the depth of the recess can preferably be between about 0.5microns and about 2 microns.

With reference to FIG. 17, a first conductive or metal film 170 is thenformed in the trenches 140 and 150. The film 170 can be formed in thesame way and have the same material as was discussed above in referenceto FIG. 6. Again, by way of non-limiting example, the thickness of thefirst metal film 170 can preferably be between about 1,000 Å (angstroms)and about 5,000 Å.

With reference to FIG. 18, a dielectric film 180 is then formed in thetrenches 140 and 150 over the film 170. The film 180 can be formed inthe same way and have the same material as was discussed above inreference to FIG. 7. Again, by way of non-limiting example, thethickness of the film 180 can preferably be between about 100 Å(angstroms) and about 500 Å or less.

With reference to FIG. 19, a second conductive or metal film 190 is thenformed in the trenches 140 and 150 over the film 180. The film 190 canbe formed in the same way and have the same material as was discussedabove in reference to FIG. 8. Again, by way of non-limiting example, thesecond metal film 190 preferably completely or substantially fills thetrenches 140 and 150 and can be applied to a thickness over layer 130 ofa few microns or less.

With reference to FIG. 20, the front side of the structure of FIG. 19 isthen subjected to a material removing step, e.g., a polishing step,which removes the metal film 190 over the layer 130. This step can beaccomplished in the same way as was discussed above in reference to FIG.9. At this point, a capacitor C and vias V are formed. However, unlikethe previous embodiment, the capacitor C is in electrical connectionwith the doped region 125 (which functions as a contact or electrode)via the first film 170 of the capacitor C. Again, by way of non-limitingexample, the thickness of the layer 130 which remains after polishingcan preferably be between about 2,000 Å (angstroms) and about 10,000 Å.

With reference to FIG. 21, the back side of the structure of FIG. 20 issubjected to a material removing step, e.g., a grinding step, whichremoves an amount of the substrate 110. This step can be accomplished inthe same way as was discussed above in reference to FIG. 10. As aresult, the vias V become electrically connected to the back side metallayer BM, while the capacitor C remains electrically insulatedtherefrom. The structure in FIG. 21 can then be subjected to furtherprocessing steps in order to form a completed semiconductor structure.Such processing will then typically provide electrical connectionsbetween the capacitor C and the vias V and structures which will beformed over the layer 130.

With reference to FIG. 22, there is shown a non-limiting method ofmaking a semiconductor structure of FIGS. 12-21 which includes the stepof forming a device and a doped region on a substrate in step 2000 (seealso FIG. 13). Trenches are then formed in the structure which extendinto the substrate in step 2010 (see also FIG. 15). This is followed byforming a recess in the shallow trench in step 2020 (see also FIG. 16).Thereafter, a first metal film is formed in the trenches in step 2030(see also FIG. 17). Then, a dielectric film is formed in the trenchesover the first metal film in step 2040 (see also FIG. 18). This isfollowed with a second metal film being formed in the trenches over thedielectric film in step 2050 (see also FIG. 19). Next, the front side ofthe structure is polished so as to form the capacitor and the vias instep 2060 (see also FIG. 20). Finally, the back side of the structure isground and a back side metal layer is applied thereto in step 2070 (seealso FIG. 21).

With reference to FIG. 23, there is shown a third non-limitingembodiment of a semiconductor structure formed in the same manner as theembodiment of FIGS. 12-22 except that the step of forming the capacitortrench (i.e., the step shown in FIG. 16) is omitted. This structure thusincludes vias V electrically connected to the back side metal layer BMand a capacitor C. Each of the vias V and the capacitor C are formedwith a first metal film 270, a dielectric film 280 and a second metalfilm 290. A doped region 225 provides a conductive path to the capacitorC via the first metal film 270. The structure in FIG. 23 can then besubjected to further processing steps in order to form a completedsemiconductor structure. Such processing will then typically provideelectrical connections between the capacitor C and the vias V andstructures which will be formed over the layer covering the substrate210.

With reference to FIG. 24, there is shown a non-limiting method ofmaking a semiconductor structure of FIG. 23 which includes the step offorming a device and a doped region on a substrate in step 3000.Trenches are then formed in the structure which extend into thesubstrate in step 3010. Thereafter, a first metal film is formed in thetrenches in step 3030. Then, a dielectric film is formed in the trenchesover the first metal film in step 3040. This is followed with a secondmetal film being formed in the trenches over the dielectric film in step3050. Next, the front side of the structure is polished so as to formthe capacitor and the vias in step 3060. Finally, the back side of thestructure is ground and a back side metal layer is applied thereto instep 3070.

The method as described above is used in the fabrication of integratedcircuit chips. The resulting integrated circuit chips can be distributedby the fabricator in raw wafer form (that is, as a single wafer that hasmultiple unpackaged chips), as a bare die, or in a packaged form. In thelatter case the chip is mounted in a single chip package (such as aplastic carrier, with leads that are affixed to a motherboard or otherhigher level carrier) or in a multichip package (such as a ceramiccarrier that has either or both surface interconnections or buriedinterconnections). In any case the chip is then integrated with otherchips, discrete circuit elements, and/or other signal processing devicesas part of either (a) an intermediate product, such as a motherboard, or(b) an end product. The end product can be any product that includesintegrated circuit chips, ranging from toys and other low-endapplications to advanced computer products having a display, a keyboardor other input device, and a central processor.

Design Flow

FIG. 25 shows a block diagram of an exemplary design flow 900 used forexample, in semiconductor design, manufacturing, and/or test. Designflow 900 may vary depending on the type of IC being designed. Forexample, a design flow 900 for building an application specific IC(ASIC) may differ from a design flow 900 for designing a standardcomponent or from a design from 900 for instantiating the design into aprogrammable array, for example a programmable gate array (PGA) or afield programmable gate array (FPGA) offered by Altera® Inc. or Xilinx®Inc. (Altera is a registered trademark of Altera Corporation in theUnited States, other countries, or both. Xilinx is a registeredtrademark of Xilinx, Inc. in the United States, other countries, orboth.) Design structure 920 is preferably an input to a design process910 and may come from an IP provider, a core developer, or other designcompany or may be generated by the operator of the design flow, or fromother sources. Design structure 920 comprises an embodiment of theinvention as shown in FIGS. 1-10, 12-21 and 23 in the form of schematicsor HDL, a hardware-description language (e.g., VERILOG®, Very High SpeedIntegrated Circuit (VHSIC) Hardware Description Language (VHDL), C,etc.). (VERILOG is a registered trademark of Cadence Design Systems,Inc. in the United States, other countries, or both.) Design structure920 may be contained on one or more machine readable medium. Forexample, design structure 920 may be a text file or a graphicalrepresentation of an embodiment of the invention as shown in FIGS. 1-10,12-21 and 23. Design process 910 preferably synthesizes (or translates)an embodiment of the invention as shown in FIGS. 1-10, 12-21 and 23 intoa netlist 980, where netlist 980 is, for example, a list of wires,transistors, logic gates, control circuits, I/O, models, etc. thatdescribes the connections to other elements and circuits in anintegrated circuit design and recorded on at least one of machinereadable medium. For example, the medium may be a CD, a compact flash,other flash memory, a packet of data to be sent via the Internet, orother networking suitable means. The synthesis may be an iterativeprocess in which netlist 980 is resynthesized one or more timesdepending on design specifications and parameters for the circuit.

Design process 910 may include using a variety of inputs; for example,inputs from library elements 930 which may house a set of commonly usedelements, circuits, and devices, including models, layouts, and symbolicrepresentations, for a given manufacturing technology (e.g., differenttechnology nodes, 32 nm, 45 nm, 90 nm, etc.), design specifications 940,characterization data 950, verification data 960, design rules 970, andtest data files 985 (which may include test patterns and other testinginformation). Design process 910 may further include, for example,standard circuit design processes such as timing analysis, verification,design rule checking, place and route operations, etc. One of ordinaryskill in the art of integrated circuit design can appreciate the extentof possible electronic design automation tools and applications used indesign process 910 without deviating from the scope and spirit of theinvention. The design structure of the invention is not limited to anyspecific design flow.

Design process 910 preferably translates an embodiment of the inventionas shown in FIGS. 1-10, 12-21 and 23, along with any additionalintegrated circuit design or data (if applicable), into a second designstructure 990. Design structure 990 resides on a storage medium in adata format used for the exchange of layout data of integrated circuitsand/or symbolic data format (e.g. information stored in a GDSII (GDS2),GL1, OASIS, map files, or any other suitable format for storing suchdesign structures). Design structure 990 may comprise information suchas, for example, symbolic data, map files, test data files, designcontent files, manufacturing data, layout parameters, wires, levels ofmetal, vias, shapes, data for routing through the manufacturing line,and any other data required by a semiconductor manufacturer to producean embodiment of the invention as shown in FIGS. 1-10, 12-21 and 23.Design structure 990 may then proceed to a stage 995 where, for example,design structure 990: proceeds to tape-out, is released tomanufacturing, is released to a mask house, is sent to another designhouse, is sent back to the customer, etc.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of the invention. Asused herein, the singular forms “a”, “an” and “the” are intended toinclude the plural forms as well, unless the context clearly indicatesotherwise. It will be further understood that the terms “comprises”and/or “comprising,” when used in this specification, specify thepresence of stated features, integers, steps, operations, elements,and/or components, but do not preclude the presence or addition of oneor more other features, integers, steps, operations, elements,components, and/or groups thereof.

The corresponding structures, materials, acts, and equivalents of allmeans or step plus function elements in the claims, if applicable, areintended to include any structure, material, or act for performing thefunction in combination with other claimed elements as specificallyclaimed. The description of the present invention has been presented forpurposes of illustration and description, but is not intended to beexhaustive or limited to the invention in the form disclosed. Manymodifications and variations will be apparent to those of ordinary skillin the art without departing from the scope and spirit of the invention.The embodiment was chosen and described in order to best explain theprinciples of the invention and the practical application, and to enableothers of ordinary skill in the art to understand the invention forvarious embodiments with various modifications as are suited to theparticular use contemplated. Accordingly, while the invention has beendescribed in terms of embodiments, those of skill in the art willrecognize that the invention can be practiced with modifications and inthe spirit and scope of the appended claims.

What is claimed:
 1. A semiconductor structure, comprising: a capacitorarranged in a first trench formed in a substrate; and a via arranged ina second trench formed in the substrate, wherein the first and secondtrenches have different depths in the substrate, and wherein the via andthe capacitor comprise a first conductive film, a second conductivefilm, and a dielectric film arranged there-between, and the firstconductive film, the second conductive film, and the dielectric filmcompletely fill the first trench and the second trench.
 2. The structureof claim 1, wherein at least one of: the via is a through wafer via; andthe via is in electrical contact with a back side metal layer of thesemiconductor structure.
 3. The structure of claim 1, wherein the firstconductive film and the second conductive film comprise substantiallythe same material.
 4. The structure of claim 1, wherein the first trenchis arranged at a first depth in the substrate.
 5. The structure of claim4, wherein the second trench is arranged at a second depth greater thanthe first depth, in the substrate.
 6. The structure of claim 1, furthercomprising a recess arranged in the first trench and the substrate. 7.The structure of claim 6, wherein the capacitor is arranged in the firsttrench and the recess.
 8. The structure of claim 6, wherein: the firsttrench is arranged at a first depth in the substrate; and the recess isarranged at a depth lesser than the first depth, in the substrate, andis arranged at a width greater than a width of the first trench.
 9. Thestructure of claim 6, wherein: the substrate comprises an isolationlayer; a depth of the recess is less than a depth of the isolationlayer, in the substrate; and surfaces of the isolation layer, the firstconductive film, the second conductive film, and the dielectric film arecoplanar.
 10. The structure of claim 1, wherein the capacitor is atleast one of: a MIM capacitor; a high density capacitor; and a greaterthan about 100 fF/μm² capacitor.